Metal-gate FinFET and fully-depleted SOI devices using total gate silicidation
- Jakub Kedzierski
- Edward Nowak
- et al.
- 2002
- IEDM 2002
Publications
201 results for Christian Lavoie
Texture formation in Ti-Ta alloy disilicide thin films
- A.S. Özcan
- K.F. Ludwig Jr.
- et al.
- 2002
- Journal of Applied Physics
Texture of TiSi 2 thin films on Si (001)
- A.S. Özcan
- K.F. Ludwig Jr.
- et al.
- 2002
- Journal of Applied Physics
Nucleation and growth kinetics of preferred C54 TiSi 2 orientations: Time-resolved x-ray diffraction measurements
- A.S. Özcan
- K.F. Ludwig Jr.
- et al.
- 2002
- Journal of Applied Physics
Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
- H. Kim
- C. Cabral
- et al.
- 2002
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Metastable and equilibrium phase formation in sputter-deposited Ti/Al multilayer thin films
- G.A. Lucadamo
- K. Barmak
- et al.
- 2002
- Journal of Applied Physics
The growth of tantalum thin films by plasma-enhanced atomic layer deposition and diffusion barrier properties
- H. Kim
- C. Cabral Jr.
- et al.
- 2002
- MRS Proceedings 2002
A self-aligned silicide process utilizing ion implants for reduced silicon consumption and control of the silicide formation temperature
- G.M. Cohen
- C. Cabral Jr.
- et al.
- 2002
- MRS Proceedings 2002
In-situ studies of silicide formation in Ti-Ta bilayer thin films on poly-Si
- A.S. Özcan
- K.F. Ludwig Jr.
- et al.
- 2002
- MRS Proceedings 2002
Effects of alloying elements on cobalt silicide formation
- C. Lavoie
- C. Cabral Jr.
- et al.
- 2002
- Journal of Electronic Materials