Conference paperInterface engineering of Si1-xGex gate stacks for high performance dual channel CMOSChoonghyun Lee, Richard G. Southwick, et al.ASICON 2017
Conference paperChannel Strain Dependence of Tinv in Strained Si and Sil-xGexFETs: Internal Strain-induced Modification of Chemical OxidationChoonghyun Lee, Shogo Mochizuki, et al.VLSI Technology 2019
Conference paperFinFET performance with Si:P and Ge:Group-III-Metal metastable contact trench alloysOleg Gluschenkov, Zuoguang Liu, et al.IEDM 2016
PaperQuantification of local strain distributions in nanoscale strained SiGe FinFET structuresShogo Mochizuki, Conal E. Murray, et al.Journal of Applied Physics
