Applied Spectroscopy Reviews

Paper

05 Dec 2006

Plasma Sources in Analytical Mass Spectrometry

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Abstract

No abstract available.

Paper

Ion-enhanced gas-surface chemistry: The influence of the mass of the incident ion

U. Gerlach-Meyer, J.W. Coburn, et al.

Surface Science

Paper

Effect of ion bombardment on the plasma-assisted etching and deposition of plasma perfluoropolymer thin films

F. Fracassi, E. Occhiello, et al.

Journal of Applied Physics

Paper

Ion-induced volatilization (IIV): A method for quantitative measurement of the amounts of perfluoropolyether lubricant on a particulate disk surface and in the media porosity

J.W. Coburn, H.F. Winters

Journal of Applied Physics

Conference paper

Role of ions in reactive ion etching

J.W. Coburn

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

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