Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
The linear map M that takes the Bernstein coefficients of a polynomial P(t) on a given interval [a, b] into those on any subinterval [a, b] is specified by a stochastic matrix which depends only on the degree n of P(t) and the size and location of [ä, b] relative to [a, b]. We show that in the • H^-norm, the condition number of M has the simple form «^(M) = [2/max(w-, vm)]n, where um = (m - a)/(b - a) and vw=(b- m)/(b - a) are the barycentric coordinates of the subinterval midpoint m = j(3 + è), and denotes the "zoom" factor (b-a)/(b-a) of the subdivision map. This suggests a practical rule-of-thumb in assessing how far Bézier curves and surfaces may be subdivided without exceeding prescribed (worst-case) bounds on the typical errors in their control points. The exponential growth of ^(M) with n also argues forcefully against the use of high-degree forms in computer-aided geometric design applications. © 1990 American Mathematical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Ehud Altman, Kenneth R. Brown, et al.
PRX Quantum
Renu Tewari, Richard P. King, et al.
IS&T/SPIE Electronic Imaging 1996
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009