Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
A unification algorithm is described which tests a set of expressions for unifiability and which requires time and space which are only linear in the size of the input. © 1978.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
James Lee Hafner
Journal of Number Theory
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008