Paper

01 Jan 1981

I-2 Shallow Silicide Contact for Shallow Junction Devices

View publication

Abstract

No abstract available.

Paper

Diffusion in the amorphous phase of Pd-19-at.%-Si metallic alloy

D. Gupta, K.N. Tu, et al.

Physical Review Letters

Paper

Low temperature doping of arsenic atoms in silicon during Pd₂Si formation

I. Ohdomari, K. Suguro, et al.

Thin Solid Films

Paper

Interfacial reaction between Ni and MBE-Grown SiGe alloy

R.D. Thompson, K.N. Tu, et al.

JES

Paper

Evaluation of glancing angle X-ray diffraction and MeV ⁴He backscattering analyses of silicide formation

S.S. Lau, W.K. Chu, et al.

Thin Solid Films

View all publications