Formation of gas-phase silyl radicals in the atomic hydrogen etching of silicon

Joseph M. Jasinski

doi:10.1016/0009-2614(93)80144-E

Chemical Physics Letters

Paper

27 Aug 1993

Formation of gas-phase silyl radicals in the atomic hydrogen etching of silicon

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Abstract

Mass spectrometric evidence is presented for the direct formation of gas-phase silyl radical, SiH3, as a product of the heterogeneous etching reaction of silicon films with hydrogen or deuterium atoms. © 1993.

Paper

Mass spectrometric studies of remote helium plasma dissociation of silane

Joseph M. Jasinski

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Paper

Absolute rate constants for silylene reactions with hydrocarbons at 298 K

Jack O. Chu, David B. Beach, et al.

Journal of Physical Chemistry

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High vibrational overtone photochemistry of cyclobutene

Joseph M. Jasinski, Joan K. Frisoli, et al.

The Journal of Chemical Physics

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Surface loss coefficients for the silyl radical

Joseph M. Jasinski

Journal of Physical Chemistry

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Abstract

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Mass spectrometric studies of remote helium plasma dissociation of silane

Absolute rate constants for silylene reactions with hydrocarbons at 298 K

High vibrational overtone photochemistry of cyclobutene

Surface loss coefficients for the silyl radical