Conference paper
Extendibility of NiPt silicide to the 22-nm node CMOS technology
Kazuya Ohuchi, Christian Lavoie, et al.
IWJT 2008
We report absolute removal rate constants for silylene by reaction with alkanes, olefins, 1,3-butadiene, and acetylene at ambient temperature and 5-Torr total pressure. Rate constants were determined by laser resonance absorption flash kinetic spectroscopy. The results show that silylene is unreactive with alkanes and reacts rapidly and unselectively with unsaturated hydrocarbons. © 1987 American Chemical Society.
Kazuya Ohuchi, Christian Lavoie, et al.
IWJT 2008
Joseph M. Jasinski, Jack O. Chu
The Journal of Chemical Physics
David B. Beach, Francoise K. LeGoues, et al.
Chemistry of Materials
Bernard S. Meyerson, Joseph M. Jasinski
Journal of Applied Physics