V. Narayanan, V.K. Paruchuri, et al.
VLSI Technology 2006
An analysis of silicate/Si(001) interfaces was discussed. The solid-state reaction of yttria and silicon oxynitride was used to create gate dielectrics with a direct yttrium silicate-silicon interface. The complete consumption of the underlying oxide through silicate formation during high-temperature annealing was indicated by medium-energy ion scattering. The small flat-band voltage shifts, indicating low quantities of charge without passivation steps was exhibited by silicate dielectrics.
V. Narayanan, V.K. Paruchuri, et al.
VLSI Technology 2006
J.H. Stathis, A. Vayshenker, et al.
VLSI Technology 2000
M. Horn-Von Hoegen, M. Copel, et al.
Physical Review B
L.Å. Ragnarsson, S. Guha, et al.
Applied Physics Letters