Publications

4 results at Plasma Chemistry and Plasma Processing

On the effect of low-energy ion bombardment on polystyrene and polymethylmethacrylate etch rates in rf plasmas
- - E. Occhiello
  - F. Garbassi
  - et al.
- 1989
- Plasma Chemistry and Plasma Processing
Quartz crystal microbalance simulation of the directionality of Si etching in CF₄ glow discharges
- - Natasha C.Us
  - R.W. Sadowski
  - et al.
- 1986
- Plasma Chemistry and Plasma Processing
Spatially resolved optical emission studies of fluorocarbon RF plasma through the use of UV-transmitting optical fibers
- - G.S. Selwyn
  - E. Kay
- 1985
- Plasma Chemistry and Plasma Processing
Plasma-assisted etching
- - J.W. Coburn
- 1982
- Plasma Chemistry and Plasma Processing