Epoxy resins for deep UV lithographyK.J. StewartM. Hatzakiset al.1988SPE Regional Technical Conference 1988
Polysilanes: photochemistry and deep UV lithographyR.D. MillerG.M. Wallraffet al.1988SPE Regional Technical Conference 1988
Novel photoresist design based on electrophilic aromatic substitutionB. ReckR.D. Allenet al.1988SPE Regional Technical Conference 1988