Low-temperature Si and Si:Ge epitaxy by ultrahigh-vacuum/chemical vapor deposition. Process fundamentalsB.S. Meyerson1990IBM J. Res. Dev
Surface chemistry of the WF6-based chemical vapor deposition of tungstenM.L. YuK.Y. Ahnet al.1990IBM J. Res. Dev
Internal probing of submicron FETs and photoemission using individual oxide trapsP. RestleAntonio Gnudi1990IBM J. Res. Dev
Surface and interfacial energies of CoSi2 and Si films. Implications regarding formation of three-dimensional silicon-silicide structuresK.N. Tu1990IBM J. Res. Dev
Diamondlike carbon films by rf plasma-assisted chemical vapor deposition from acetyleneA. GrillB.S. Meyersonet al.1990IBM J. Res. Dev
Picosecond photoemission probing of integrated circuits. Capabilities, limitations, and applicationsR. ClaubergH. Behaet al.1990IBM J. Res. Dev