Publications

2357 results at Journal of Applied Physics

Low-temperature deposition of high-quality silicon dioxide by plasma-enhanced chemical vapor deposition
- - J. Batey
  - E. Tierney
- 1986
- Journal of Applied Physics
Comment on "Misfit stress in InGaAs/InP heteroepitaxial structures grown by vapor-phase epitaxy" (Journal of Applied Physics (1985) 57 (249))
- - I.C. Noyan
  - Armin Segmüller
- 1986
- Journal of Applied Physics
Resistivity of the solid solutions (Co-Ni)Si₂
- - F.M. D'Heurle
  - J. Tersoff
  - et al.
- 1986
- Journal of Applied Physics
Interactions between Au and Cu across a Ni barrier layer
- - Chin-An Chang
- 1986
- Journal of Applied Physics
Boron, phosphorus, and arsenic diffusion in tisi₂
- - P. Gas
  - V.R. Deline
  - et al.
- 1986
- Journal of Applied Physics
Hole transport in a molecularly doped polymer: P-diethylaminobenzaldehyde- diphenyl hydrazone in polycarbonate
- - L.B. Schein
  - A. Rosenberg
  - et al.
- 1986
- Journal of Applied Physics
Electron heating in silicon nitride and silicon oxynitride films
- - D.J. DiMaria
  - J.R. Abernathey
- 1986
- Journal of Applied Physics
Stability of oxides grown on tantalum silicide surfaces
- - A. Cros
  - K.N. Tu
- 1986
- Journal of Applied Physics
Rutherford backscattering studies of plasma-etched silicon
- - Gottlieb S. Oehrlein
- 1986
- Journal of Applied Physics
Doping dependence of the schottky-barrier height of ti-pt contacts to n-gallium arsenide
- - R.F. Broom
  - H.P. Meier
  - et al.
- 1986
- Journal of Applied Physics