Publications

221 results at Microelectronic Engineering

Chemically assisted ion beam etching process for high quality laser mirrors
- - P. Buchmann
  - H.P. Dietrich
  - et al.
- 1989
- Microelectronic Engineering
Electron beam lithography of sub-0.1μm circuits
- - S. Rishton
  - D. Kern
  - et al.
- 1989
- Microelectronic Engineering
A comparison of the E-beam sensitivities and relative O₂-plasma stabilities of organosilicon polymers.Part III. Lithographic characteristics of poly-1,1,3-trimethyl-1-sila - and poly-1,1,3,3-tetramethyl-1,3- disilacyclobutenes and related silmethylene polymers
- - E. Babich
  - J. Paraszczak
  - et al.
- 1989
- Microelectronic Engineering
Fully scaled 0.5 μm MOS cicuits by synchroton X-ray lithography: Resist systems and line width control
- - David Seeger
  - K.T. Kwietniak
  - et al.
- 1989
- Microelectronic Engineering
Highly selective KOH-based etchant for boron-doped silicon structures
- - E. Bassous
  - A.C. Lamberti
- 1989
- Microelectronic Engineering
X-ray transmission through low atomic number particles
- - R.A. DellaGuardia
  - David Seeger
  - et al.
- 1989
- Microelectronic Engineering
Resist image enhancement by UV-, soft vacuum pulsed electron beams and organometallic compounds
- - Hiroyuki Hiraoka
- 1987
- Microelectronic Engineering
The use of organosilicon polymers in multilayer plasma resist processing
- - J. Paraszczak
  - E. Babich
  - et al.
- 1987
- Microelectronic Engineering
Electrical resistivity and radiation damage in boro-hydro-nitride x-ray lithography mask substrates
- - S.S. Dana
  - J. Batey
  - et al.
- 1987
- Microelectronic Engineering
Fabrication by tri-level electron beam lithography of X-ray masks with 50nm linewidths, and replication by X-ray nanolithography
- - Erik H. Anderson
  - D. Kern
  - et al.
- 1987
- Microelectronic Engineering