Publications

18 results at VLSI Technology 2005

A 0.168μm ²/0.11μm ² highly scalable high performance embedded DRAM cell for 90/65-nm logic applications
- - G. Wang
  - P. Parries
  - et al.
- 2005
- VLSI Technology 2005
Extremely-scaled double-gate CMOS with non-self-aligned back gate
- - Keunwoo Kim
  - Hussein I. Hanafi
  - et al.
- 2005
- VLSI Technology 2005
High mobility solution-deposited chalcogenide films for flexible applications
- - David B. Mitzi
  - Delia J. Milliron
  - et al.
- 2005
- VLSI Technology 2005
Characteristics of high performance PFETs with embedded SiGe source/drain and 〈100〉 channels on 45° rotated wafers
- - Qiqing Ouyang
  - Meikei Ieong
  - et al.
- 2005
- VLSI Technology 2005
Carbon nanotube electronic and optoelectronic devices
- - Phaedon Avouris
- 2005
- VLSI Technology 2005
A comparative study of NBTI as a function of Si substrate orientation and gate dielectrics (SiON and SiON/HfO ₂)
- - S. Zafar
  - M. Yang
  - et al.
- 2005
- VLSI Technology 2005
Switching delay variability in NMOS and PMOS PDSOI passgate circuits
- - Mark Ketchen
  - Manjul Bhushan
  - et al.
- 2005
- VLSI Technology 2005
Recent advances in MRAM technology
- - W.J. Gallagher
  - D.W. Abraham
  - et al.
- 2005
- VLSI Technology 2005