Publications

221 results at Microelectronic Engineering

Thermoelastic effects on x-ray lithography masks under pulsed irradiation
- - Iqbal Shareef
  - Juan R. Maldonado
  - et al.
- 1990
- Microelectronic Engineering
Silylation of resist materials using di- and polyfunctional organosilicon compounds
- - E. Babich
  - J. Paraszczak
  - et al.
- 1990
- Microelectronic Engineering
CW and time resolved luminescence study of dry etch damage in semiconductor wires
- - B.E. Maile
  - G. Mayer
  - et al.
- 1990
- Microelectronic Engineering
Highly selective KOH-based etchant for boron-doped silicon structures
- - E. Bassous
  - A.C. Lamberti
- 1989
- Microelectronic Engineering
High speed electron beam testing
- - George Chiu
  - Jean-Marc Halbout
  - et al.
- 1989
- Microelectronic Engineering
Fully scaled 0.5μm MOS circuits by synchrotron radiation X-ray lithography: Mask fabrication and chraterization
- - R. Viswanathan
  - R.E. Acosta
  - et al.
- 1989
- Microelectronic Engineering
Electron beam lithography of sub-0.1μm circuits
- - S. Rishton
  - D. Kern
  - et al.
- 1989
- Microelectronic Engineering
Fully scaled 0.5 μm MOS cicuits by synchroton X-ray lithography: Resist systems and line width control
- - David Seeger
  - K.T. Kwietniak
  - et al.
- 1989
- Microelectronic Engineering
Using surface wave produced plasmas to determine the frequency effect upon etching of polyimide in RF and microwave sustained plasmas
- - G. Sauvé
  - M. Moisan
  - et al.
- 1989
- Microelectronic Engineering
Nanolithography at 350 KV in a TEM
- - A.N. Broers
  - A.E. Timbs
  - et al.
- 1989
- Microelectronic Engineering