Properties and Microelectronic Applications of Thin Films of Refractory Metal Nitrides
- Marc Wittmer
- 1985
- JVSTA
Publications
176 results at JVSTA
Summary Abstract: Microstructure and electrical conductivity of plasma deposited gold/fluorocarbon composite films
- J. Perrin
- B. Despax
- et al.
- 1985
- JVSTA
Effects of biased cosputtering on resistivity and step coverage in tungsten silicide films
- K.W. Choi
- K.Y. Ahn
- 1985
- JVSTA
Photoemission spectroscopy study of aluminum-polyimide interface
- J.W. Bartha
- P.O. Hahrt
- et al.
- 1985
- JVSTA
Formation of TiSi2 and TiN during nitrogen annealing of magnetron sputtered Ti films
- E.D. Adams
- K.Y. Ahn
- et al.
- 1985
- JVSTA
Chemical bonding and reaction at metal/polymer interfaces
- P.S. Ho
- P.O. Hahn
- et al.
- 1985
- JVSTA
Summary Abstract: The origin of oxidation induced enhancement of Si+ sputter yield in SIMS
- D.J. Vitkavage
- J.G. Clabes
- et al.
- 1985
- JVSTA
Electron-gun Evaporators of Refractory Metals Compatible with Molecular Beam Epitaxy
- M. Heiblum
- J. Bloch
- et al.
- 1985
- JVSTA
Summary Abstract: Electromigration studies of al-intermetallic structures
- T. Kwok
- P.S. Ho
- et al.
- 1984
- JVSTA
Theoretical study of the adsorption of oxygen on Si(100)
- Inder P. Batra
- P.S. Bagus
- et al.
- 1984
- JVSTA