Accuracy and efficiency in electron beam proximity effect correction
- S.J. Wind
- P.D. Gerber
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Publications
168 results at Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Challenges and progress in x-ray lithography
- Jerome P. Silverman
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Fabrication of Cu interconnects of 50 nm linewidth by electron-beam lithography and high-density plasma etching
- Y. Hsu
- T. Standaert
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Directional copper deposition using dc magnetron self-sputtering
- Zbigniew J. Radzimski
- Witold M. Posadowski
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Light-coupling masks: An alternative, lensless approach to high-resolution optical contact lithography
- Heinz Schmid
- Hans Biebuyck
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Comparison of secondary ion mass spectrometry profiling of sub-100 nm ultrashallow junctions using NO+2 and O+2 sputtering
- P.A. Ronsheim
- K.L. Lee
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Directional and ionized physical vapor deposition for microelectronics applications
- S.M. Rossnagel
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Investigation of existing defects and defect generation in device-grade SiO2 by ballistic electron emission spectroscopy
- H.J. Wen
- R. Ludeke
- 1997
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Minimum emission current of liquid metal ion sources
- J.C. Beckman
- T.H.P. Chang
- et al.
- 1997
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Low energy electron beam top surface image processing using chemically amplified AXT resist
- C.S. Whelan
- D.M. Tanenbaum
- et al.
- 1997
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures