Publications

16 results for Will Conley

New chemistry in the i)esign of chemically amplified positive resists
- - Robert D. Allen
  - Quan P. Ly
  - et al.
- 1993
- Microlithography 1993
Designing high performance KrF and ArF single layer resists with methacrylate polymers
- - Robert D. Allen
  - Gregory M. Wallraff
  - et al.
- 1993
- J. Photopolym. Sci. Tech.
High-speed aqueous-developing negative resist based on triflic-acid-catalyzed epoxy polymerization
- - R.D. Allen
  - Willard E. Conley
  - et al.
- 1992
- Microlithography 1992
Aspects in the progression of materials and processes for 256Mb-DRAM and beyond
- - Will Conley
- 1991
- SPIE Tutorial Texts in Optical Engineering 1991
Photoresist technology for 0.25 μm lithography
- - Will Conley
- 1991
- Single Frequency Semiconductor Lasers 1991
Negative tone aqueous developable resist for photon electron and X-ray lithography
- - Willard Conley
  - Wayne Moreau
  - et al.
- 1990
- Microlithography 1990