J.H. Stathis, R. Bolam, et al.
INFOS 2005
Thin film deposition with physical vapor deposition (PVD) and related technology was studied. Variations of PVD processes include thermal evaporation, physical sputtering, laser ablation and arc-based emission. The modifications included reactive sputter deposition, the unbalanced magnetron, collimated and ionized sputter deposition.
J.H. Stathis, R. Bolam, et al.
INFOS 2005
M.A. Lutz, R.M. Feenstra, et al.
Surface Science
R. Ghez, J.S. Lew
Journal of Crystal Growth
Sung Ho Kim, Oun-Ho Park, et al.
Small