Conference paper
Compression for data archiving and backup revisited
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009
The electrical and physical properties of ultra-thin zirconium silicate films deposited by the jet-vapor-deposition (JVD) process were reported. The fabrication of the films with equivalent oxide thickness of 1 nm with high thermal stability, low leakage and good electrical properties was shown. It was shown that zirconium silicate films can survive an annealing temperature as high as 1000°C.
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009
Frank Stem
C R C Critical Reviews in Solid State Sciences
Hiroshi Ito, Reinhold Schwalm
JES
T.N. Morgan
Semiconductor Science and Technology