A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
Changes of the work function due to adsorption of alkali atoms by a high-work-function substrate are studied using a very simple ("jellium") model of the metallic substrate-adsorbate system. A self-consistent quantum-mechanical analysis of the model leads to a work-function-vs-coverage curve with a minimum at a coverage below that of a single full adsorbed layer, and a maximum at completion of the layer. Good agreement with the results of recent measurements is obtained for these extremal values; and, though not designed to treat very low coverages, the model yields an initial dipole moment in satisfactory agreement with experiment. The computed full-layer work function is very nearly equal to that obtained theoretically for the corresponding bulk sample. A study of limiting cases provides a framework for viewing the results of the calculation in a coherent way. © 1971 The American Physical Society.
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
Julian J. Hsieh
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
S. Cohen, T.O. Sedgwick, et al.
MRS Proceedings 1983
H.D. Dulman, R.H. Pantell, et al.
Physical Review B