Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We calculate the maximum acceptor concentrations (acceptor solubilities) for BeSe, MgSe, CaSe, and BeTe doped with Li and Na acceptors. All of these compounds but BeTe have lower acceptor solubilities than ZnSe, which can explain the low-acceptor concentrations achieved to date in ZnMgSSe cladding layers used in ZnSe-based lasers. © 1995 The American Physical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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