T. Vanzandt, R. Browning, et al.
Journal of Electron Spectroscopy and Related Phenomena
A specimen introduction/reaction system is described for a transmission electron microscope modified for UHV operation. The dry-pumped and UHV-compatible reaction chamber can be used for subjecting microscope specimens to RF-plasma treatments. The plasma oxidation and reduction of an in-situ-deposited particulate palladium film supported on amorphous alumina is described. A significant degree of redispersion is caused by this low-temperature process. © 1987.
T. Vanzandt, R. Browning, et al.
Journal of Electron Spectroscopy and Related Phenomena
H. Pinkvos, H. Poppa, et al.
Ultramicroscopy
H.-I. Su, K. Heinemann, et al.
Journal of Solid State Chemistry
H. Poppa, R.D. Moorhead, et al.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films