S. Cohen, T.O. Sedgwick, et al.
MRS Proceedings 1983
Conference paper
Statistical limitations of printing 50 and 80 nm contact holes by EUV lithography
Abstract
No abstract available.
Related
J.H. Stathis, R. Bolam, et al.
INFOS 2005
Douglass S. Kalika, David W. Giles, et al.
Journal of Rheology
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010