T.N. Jackson, P. Solomon, et al.
IEEE T-ED
The stability of the luminescence from porous Si has been improved by rapid thermal oxidation. As-prepared and oxidized samples have been compared by cathodoluminescence and photoluminescence. Electron beam excitation resulted in rapid decay of the porous Si emission from as-prepared samples. Photoluminescence measurements from as-prepared samples in oxygen showed a similar degradation. In contrast, the rapid thermal oxidized samples showed a dramatic improvement in stability under either electron beam or photoexcitation.
T.N. Jackson, P. Solomon, et al.
IEEE T-ED
R.T. Collins, Z. Schlesinger, et al.
Physical Review Letters
S. Shapira, U. Sivan, et al.
Surface Science
J.A. Kash, M. Zachau, et al.
Semiconductor Science and Technology