Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
The solution for potentials in a lap joint of arbitrary geometry and dissimilar materials obtained using conformal mapping is presented. The procedure leads to a dual integral equation which is solved for arbitrary potential distribution across the common segment. The continuity of potential and flux is then imposed to obtain the potential distribution across the interface. © 1987 Oxford University Press.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
John S. Lew
Mathematical Biosciences
David Cash, Dennis Hofheinz, et al.
Journal of Cryptology
Elizabeth A. Sholler, Frederick M. Meyer, et al.
SPIE AeroSense 1997