K.Z. Zhang, Leah M. Meeuwenberg, et al.
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Paper
Si/SiO2 interface: New structures and well-defined model systems
Abstract
A well-defined silicon oxide/silicon interface way synthesized by the reaction of the precursor cluster H8Si8O12 with Si(100) surface and characterized using Si 2p core level photoemission spectroscopy. Information gained regarding the assignments of silicon oxide group shifts and peak widths is used to evaluate assumptions and assignments of photoemission spectra of silicon oxide interfaces. © 1993 The American Physical Society.
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