Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
The partition function of the Hubbard model with local attraction and long-range Coulomb repulsion between electrons is written as a functional integral with an action A involving a pairing field Δ and a local potential V. After integration over V and over fluctuations in \Δ\2, the final form of A involves a Josephson coupling between the local phases of Δ and a "kinetic energy" term, representing the screened Coulomb interaction between charge fluctuations. The competition between Josephson coupling and charging energy allows to understand the relation between TC and composition in high-TC materials, in particular superlattices, alloys and bulk systems of low doping.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
J. Paraszczak, J.M. Shaw, et al.
Micro and Nano Engineering
A. Gangulee, F.M. D'Heurle
Thin Solid Films
H.D. Dulman, R.H. Pantell, et al.
Physical Review B