Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
A number of agents can arrange themselves equidistantly in a row via a sequence of adjustments, based on a simple "local" interaction. The convergence of the configuration to the desired one is exponentially fast. A similarity is shown between this phenomenon and the dynamics of pulse propagation along a distributed RC line, and a conjecture is made concerning the evolution of a similar system with a probabilistic rule of behavior.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Daniel J. Costello Jr., Pierre R. Chevillat, et al.
ISIT 1997
Fausto Bernardini, Holly Rushmeier
Proceedings of SPIE - The International Society for Optical Engineering
Michael Moreinis, Arkadiy Morgenshtein, et al.
ICECS 2004