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Conference paperPerformance data on new tunable attenuating PSM for 193nm and 157nm lithographyHans Becker, Frank Schmidt, et al.Photomask and Next-Generation Lithography Mask Technology 2004
PaperHAG-based application layer multicast system for streaming mediaRuixiong Tian, Zhe Xiang, et al.Qinghua Daxue Xuebao/Journal of Tsinghua University
