Conference paperUsing simulation-based stochastic approximation to optimize staffing of systems with skills-based-routingZohar Feldman, Avishai MandelbaumWSC 2010
Conference paperPerformance data on new tunable attenuating PSM for 193nm and 157nm lithographyHans Becker, Frank Schmidt, et al.Photomask and Next-Generation Lithography Mask Technology 2004
Conference paperMultiple range query optimization with distributed cache indexingBeomseok Nam, Henrique Andrade, et al.ACM/IEEE SC 2006
Conference paperBetter on wafer performance and mask manufacturability of contacts with no or non-traditional serifsDonald Samuels, Ian StobertSPIE Photomask Technology + EUV Lithography 2007
