Douglass S. Kalika, David W. Giles, et al.
Journal of Rheology
Photoemission secondary-electron energy distributions and yield measurements for (100) EuO show that "quasielastic" rather than inelastic electron scattering dominates the photoemission escape process for electrons excited within a few eV of threshold. In this "quasielastic" scattering regime (with a large effective escape depth ∼ 50-100), it is suggested that the spin polarization need not be conserved in the photoemission escape process, and that reported "paramagnetic" spin-polarized photoemission at 10 °K is possibly due to quasielastic spin-flip scattering. © 1973 The American Physical Society.
Douglass S. Kalika, David W. Giles, et al.
Journal of Rheology
T.N. Morgan
Semiconductor Science and Technology
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009
I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992