L.K. Wang, A. Acovic, et al.
MRS Spring Meeting 1993
Photoemission secondary-electron energy distributions and yield measurements for (100) EuO show that "quasielastic" rather than inelastic electron scattering dominates the photoemission escape process for electrons excited within a few eV of threshold. In this "quasielastic" scattering regime (with a large effective escape depth ∼ 50-100), it is suggested that the spin polarization need not be conserved in the photoemission escape process, and that reported "paramagnetic" spin-polarized photoemission at 10 °K is possibly due to quasielastic spin-flip scattering. © 1973 The American Physical Society.
L.K. Wang, A. Acovic, et al.
MRS Spring Meeting 1993
Peter J. Price
Surface Science
P.C. Pattnaik, D.M. Newns
Physical Review B
R.J. Gambino, N.R. Stemple, et al.
Journal of Physics and Chemistry of Solids