Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
This paper describes how authors have combined a number of tools (most of which are tailored to a particular programming language) into a single system to aid in the reading, writing, and running of programs. Discussed is the efficacy and the structure of two such systems, one of which has been used to build several large application programs.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
B.K. Boguraev, Mary S. Neff
HICSS 2000
Lixi Zhou, Jiaqing Chen, et al.
VLDB
Israel Cidon, Leonidas Georgiadis, et al.
IEEE/ACM Transactions on Networking