Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
The temperature-dependent resistivity of the molecular conductor Lix{Pt[S2C2(CN)2] 2}2H2O, which at ambient pressure has a Peierls transition at 213 K, has been measured at pressures up to 10 kbar. At high temperatures the metallic properties are improved with increasing pressure and at low temperatures the activation energy decreases. Our interpretation is that the Peierls instability is gradually suppressed by pressure because of an increased interchain coupling. © 1985 The American Physical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
R. Ghez, M.B. Small
JES
K.A. Chao
Physical Review B
Douglass S. Kalika, David W. Giles, et al.
Journal of Rheology