Conference paperNEW RELIABLE STRUCTURE FOR HIGH TEMPERATURE MEASUREMENT OF SILICON WAFERS USING A SPECIALLY ATTACHED THERMOCOUPLE.S. Cohen, T.O. Sedgwick, et al.MRS Proceedings 1983
PaperThe Etching of Crystallographically Determined Orifices in SapphireA. Reisman, M. Berkenblit, et al.JES
Conference paperEffects of KrF laser radiation on fused-silica glass: a comparison of samples exposed in air vs vacuumI.K. Pour, D.J. Krajnovich, et al.SPIE Optical Materials for High Average Power Lasers 1992
PaperThermally Developable, Positive Resist Systems with High SensitivityHiroshi Ito, Reinhold SchwalmJES