Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Paper
Plasma etching — a discussion of mechanisms
Abstract
No abstract available.
Related
Surendra B. Anantharaman, Joachim Kohlbrecher, et al.
MRS Fall Meeting 2020
E. Burstein
Ferroelectrics
Douglass S. Kalika, David W. Giles, et al.
Journal of Rheology