Harold F. Winters, J.W. Coburn, et al.
JVSTA
Paper
Plasma-assisted etching of tungsten films: A quartz-crystal microbalance study
Abstract
The plasma-assisted etching of magnetron-sputtered polycrystalline tungsten films in CF4-H2 and CF4-O2 glow discharges has been studied as a function of ion energy using quartz-crystal microbalance methods supplemented by vacuum-transfer Auger electron spectroscopy and actinometric emission spectroscopy.
Related
K. Kehler, J.W. Coburn, et al.
JVSTA
Conference paper
Role of ions in reactive ion etching
J.W. Coburn
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
J.W. Coburn
Review of Scientific Instruments