Conference paperHigh resolution polymer pattern fabrications with Low energy proton beamsH. HiraokaMicrolithography 1984
Conference paperEnhancement of RIE resistance of conventional resist materialsH. HiraokaProceedings of SPIE 1989
Conference paperDEEP UV PHOTOLITHOGRAPHY WITH COMPOSITE PHOTORESISTS MADE OF POLY(OLEFIN SULFONES).H. Hiraoka, L.W. Welsh Jr.ACS National Meeting 1983
Conference paperAqueous developable, negative working resist made of chlorinated novolac resinH. Hiraoka, A.M. Patlach, et al.Proceedings of SPIE 1989