PaperKinetic model for the chemical vapor deposition of tungsten in the silane reduction processJulian J. HsiehJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paperCharacterization of thin dielectric films as copper diffusion barriers using triangular voltage sweepS. Cohen, J.C. Liu, et al.MRS Spring Meeting 1999
Conference paperAnomalous interface degradation of a-Si:H TFTs during LCD lifetimeFrank R. Libsch, Takatoshi TsujimuraActive Matrix Liquid Crystal Displays Technology and Applications 1997
PaperGrowth instability in diffusion controlled polymerizationJ.H. Kaufman, Owen R. Melroy, et al.Synthetic Metals
