PaperOn the phenomenological model of preferred sputtering for SIMS and Auger profiling: A critical analysisN.J. Chou, M.W. ShaferSurface Science
PaperMechanism of microwave plasma etching of polyimides in O2 and CF4 gas mixturesN.J. Chou, J. Parazsczak, et al.Microelectronic Engineering
PaperEffect of O+ and Ne+ implantation on the surface characteristics of thermally oxidized SiN.J. Chou, B.L. CrowderJournal of Applied Physics
PaperApplication of Triangular Voltage Sweep Method to Mobile Charge Studies in MOS StructuresN.J. ChouJES
