William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
We describe how the unique capabilities of molecular beam epitaxy together with the electron-beam lithography and reactive-ion etching can be utilized to realize novel quasi-one- and zero-dimensional electron systems. We also present the results of capacitive and tunneling studies on these quantum systems. © 1989.
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
P. Martensson, R.M. Feenstra
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Biancun Xie, Madhavan Swaminathan, et al.
EMC 2011
Frank Stem
C R C Critical Reviews in Solid State Sciences