Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
We describe how the unique capabilities of molecular beam epitaxy together with the electron-beam lithography and reactive-ion etching can be utilized to realize novel quasi-one- and zero-dimensional electron systems. We also present the results of capacitive and tunneling studies on these quantum systems. © 1989.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
E. Burstein
Ferroelectrics
P.C. Pattnaik, D.M. Newns
Physical Review B
Julian J. Hsieh
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films