On the refinement of the binary symmetric markov source

Luis Lastras; Toby Berger

doi:10.1109/ISIT.2001.936058

IEEE International Symposium on Information Theory - Proceedings

Paper

01 Jan 2001

On the refinement of the binary symmetric markov source

View publication

Abstract

The BSMSn source is addressed in this study. It is shown that BSMSn is not successively refinable under the Hamming distortion measure, provided that n > 2.

Conference paper

Characterization of photoresist spatial resolution by interferometric lithography

John A. Hoffnagle, William D. Hinsberg, et al.

Microlithography 2003

Paper

A generic grouping algorithm and its quantitative analysis

Arnon Amir, Michael Lindenbaum

IEEE Transactions on Pattern Analysis and Machine Intelligence

Conference paper

Total Source Mask Optimization: High-capacity, resist modeling, and production-ready mask solution

Moutaz Fakhry, Yuri Granik, et al.

SPIE Photomask Technology + EUV Lithography 2011

Paper

On some properties of contracting matrices

Chai Wah Wu

Linear Algebra and Its Applications

View all publications

Abstract

Related

Characterization of photoresist spatial resolution by interferometric lithography

A generic grouping algorithm and its quantitative analysis

Total Source Mask Optimization: High-capacity, resist modeling, and production-ready mask solution

On some properties of contracting matrices