Paul M. Ferm, Sarah R. Kurtz, et al.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
A nanomolding process for producing 55-nm-diameter magnetic islands over 3-cm-wide areas is described. A master pattern of SiO2 pillars is used to form a polymeric mold, which is in turn used to mold a photopolymer resist film. This latter film is used as a resist for etching SiO2, yielding a pattern of pillars. Finally, an 11-nm-CoPt multilayer is deposited. Magnetic force microscopy reveals that the film on top of each pillar is a magnetically isolated single domain that switches independently. © 2002 American Institute of Physics.
Paul M. Ferm, Sarah R. Kurtz, et al.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
John H. Frederick, Gary M. McClelland, et al.
The Journal of Chemical Physics
Sang-Min Park, Oun-Ho Park, et al.
Nanotechnology
Amir Capua, Charles T. Rettner, et al.
Physical Review Letters