PaperDynamics of SiF4 desorption during etching of silicon by XeF2F.A. HouleThe Journal of Chemical Physics
PaperDeep-ultraviolet interferometric lithography as a tool for assessment nf chemically amplified photoresist performanceW.D. Hinsberg, F.A. Houle, et al.Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperLithographic Imaging Techniques for the Formation of Nanoscopic FeaturesG.M. Wallraff, W.D. HinsbergChemical Reviews
