G.M. Cohen, P.M. Mooney, et al.
MRS Proceedings 2002
Strained Si devices exhibit enhanced carrier mobility compared to that of standard Si CMOS devices of the same dimensions. Recent strained Si CMOS device results are reviewed. Materials issues related to the strained Si/relaxed SiGe heterostructures required for a strained Si CMOS technology are discussed.
G.M. Cohen, P.M. Mooney, et al.
MRS Proceedings 2002
L.S. Pann, M.A. Tischler, et al.
Journal of Applied Physics
L.J. Huang, J.O. Chu, et al.
VLSI Technology 2001
M.I. Nathan, S. Tiwari, et al.
Journal of Applied Physics