Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Given a graph G with m edges and n nodes, a spanning tree T of G, and an edge e that is being deleted from or inserted into G, we give efficient O (n) algorithms to compute a possible swap for e that minimizes the diameter of the new spanning tree. This problem arises in high-speed networks, particularly in optical networks. © 1998 Springer-Verlag New York Inc.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Simeon Furrer, Dirk Dahlhaus
ISIT 2005
David W. Jacobs, Daphna Weinshall, et al.
IEEE Transactions on Pattern Analysis and Machine Intelligence
Harpreet S. Sawhney
IS&T/SPIE Electronic Imaging 1994