F. Holtzberg, R.J. Gambino, et al.
Journal of Physics and Chemistry of Solids
Multilayers of Cu10 Å/(Co10 Å/Cu10 Å)n, where n is the number of bilayers, shows a nonlinear increase of magnetoresistance ratio (MR%) with increasing n. For each value of n the resistivity decreases with applied field. MR values at 4.2 K are less than 2% for n≤16 but increase to 38% at n=128. Conduction electron mean free paths (l), calculated from film resistivity as a function of total film thickness, increase from l=150 to 470 Å when the applied magnetic field changes from zero to 18 kOe. The values obtained for l indicate that for n≤16 MR is reduced by diffuse surface scattering while for n≥16 MR surface scattering is less important and the Co atomic moment ordering is the most important factor. About half the decrease in resistivity with field is associated with the final 2% increase in magnetization for fields above 5 kOe which we interpret in terms of Co interface disorder.
F. Holtzberg, R.J. Gambino, et al.
Journal of Physics and Chemistry of Solids
T. Mizoguchi, T.R. McGuire, et al.
Physical Review Letters
J.M.D. Coey, P. Freitas, et al.
Physical Review B
T.R. McGuire, F. Holtzberg, et al.
Journal of Physics and Chemistry of Solids