J. Tersoff
Applied Surface Science
Extended x-ray-absorption fine-structure measurements for 0.1, 0.7, and 7 at.% arsenic impurities in single-crystal silicon yield As-to-Si nearest-neighbor distances of 2.41 ± 0.02, which are 0.06 (2.5%) greater than the Si-to-Si distance in pure silicon. Next-nearest-neighbor distances are 3.85 ± 0.02, only 0.01 (0.3%) greater than the corresponding Si-to-Si distance. © 1986 The American Physical Society.
J. Tersoff
Applied Surface Science
Kigook Song, Robert D. Miller, et al.
Macromolecules
J. Paraszczak, J.M. Shaw, et al.
Micro and Nano Engineering
K.N. Tu
Materials Science and Engineering: A