Conference paper
High-performance SiGe pMODFETs grown by UHV-CVD
S.J. Koester, R. Hammond, et al.
EDMO 1999
We report on the dc and RF characterization of laterally scaled, Si - SiGe n-MODFETs. Devices with gate length, Lg, of 80 nm had fT = 79 Ghz and fmax = 212 Ghz, while devices with Lg = 70 nm had fT as high as 92 Ghz. The MODFETs displayed enhanced fT at reduced drain-to-source voltage, Vds, compared to Si MOSFETs with similar fT at high Vds. © 2005 IEEE.
S.J. Koester, R. Hammond, et al.
EDMO 1999
K. Ismail, M. Arafa, et al.
Applied Physics Letters
P.M. Mooney, K. Rim, et al.
Solid-State Electronics
K.L. Lee, J.O. Chu, et al.
IEDM 2002